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Conductors Created By Metal Deposition Using A Selective Passivation Layer And Related Methods
Patentne leiutis: Conductors Created By Metal Deposition Using A Selective Passivation Layer And Related Methods; Omanikud: Semiconductor Research Corporation; Autorid: Jeff Kelber, Jipu Lei, Noel Magtoto, Sergei Rudenja; Prioriteedi kuupäev: 25.02.2004.
Patentne leiutis
Conductors Created By Metal Deposition Using A Selective Passivation Layer And Related Methods
Conductor structures include a substrate, a first conducting layer that is selectively passivated from growth of unwanted surface layers by the application of a selective passivation layer, and a second conducting layer that is applied onto the selective passivation layer. The selective passivation layer prevents the combination of unwanted materials with the first conducting layer while allowing the combination of the applied second conducting layer with the first conducting layer. The selective passivation layer is displaced by the second conducting layer and remains as a passivation layer on the exposed surface of the second conducting layer being displaced, thereby protecting the first and second conducting layers from unwanted materials or unwanted surface layers. Methods of fabricating conductor structures are also provided. Publication Date: Aug 26, 2004
  • Semiconductor Research Corporation
Prioriteeditaotlus
25.02.2004
Rahvusvaheline (IPC)
US Patent Application No: 2004/0166,658
Ameerika Ühendriigid
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Järgnevad taotlused (1)
KuupäevNumberPatendiametRiikURLFailStaatus
26.08.2004Ameerika ÜhendriigidKaitstud
Välja antud kaitsedokumendid (1)
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19.05.2009US 7,534,967 B2Kaitstud