Micro-Raman spectroscopy and X-ray diffraction studies of atomic-layer-deposited ZrO2 and HfO2 thin films

Tkachev, SN.; Manghnani, MH.; Niilisk, A.; Aarik, J.; Mandar, H. (2005). Micro-Raman spectroscopy and X-ray diffraction studies of atomic-layer-deposited ZrO2 and HfO2 thin films. Journal of Materials Science, 40 (16), 4293−4298.
ajakirjaartikkel
Tkachev, SN.; Manghnani, MH.; Niilisk, A.; Aarik, J.; Mandar, H.
  • Inglise
Journal of Materials Science
Springer
0022-2461
40
16
2005
42934298
6
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

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