Etching Rates of TiO2 and Al2O3 Thin Films Grown by Atomic Layer Deposition

Netšipailo, I.; Aarik, J.; Aidla, A.; Asari, J.; Ritslaid, P.; Kapšai, J.; Arnus, J.; Sammelselg, V. (2009). Etching Rates of TiO2 and Al2O3 Thin Films Grown by Atomic Layer Deposition. Book of abstracts: Baltic Conference on Atomic Layer Deposition 2009; Uppsala, Sweden; June 15-16, 2009. Sweden: Uppsala Universitet, P24.
publitseeritud konverentsiettekanne
Netšipailo, I.; Aarik, J.; Aidla, A.; Asari, J.; Ritslaid, P.; Kapšai, J.; Arnus, J.; Sammelselg, V.
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Book of abstracts
Baltic Conference on Atomic Layer Deposition 2009; Uppsala, Sweden; June 15-16, 2009
Sweden
Uppsala Universitet
2009
P24
Ilmunud
5.2. Konverentsiteesid, mis ei kuulu valdkonda 5.1

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