Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Films

Kukli, Kaupo; Kemell, Marianna; Castán, Helena; Dueñas, Salvador; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Heikkilä, Mikko; Ritala; Leskelä, Markku (2018).

Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Films

. ECS Journal of Solid State Science and Technology, 7 (5), P287−P294.10.1149/2.0021806jss.
ajakirjaartikkel
Kukli, Kaupo; Kemell, Marianna; Castán, Helena; Dueñas, Salvador; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Heikkilä, Mikko; Ritala; Leskelä, Markku
  • Inglise

Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Films

ECS Journal of Solid State Science and Technology
2162-8769
7
5
2018
P287P294
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

Viited terviktekstile

dx.doi.org/10.1149/2.0021806jss