Electric and Magnetic Properties of Atomic Layer Deposited ZrO2-HfO2 Thin Films

Kalam, Kristjan; Seemen, Helina; Mikkor, Mats; Ritslaid, Peeter; Stern, Raivo; Dueñas, Salvador; Castán, Helena; Tamm, Aile; Kukli, Kaupo (2018). Electric and Magnetic Properties of Atomic Layer Deposited ZrO2-HfO2 Thin Films. ECS Journal of Solid State Science and Technology, 7 (9), 117−122.10.1149/2.0041809jss.
ajakirjaartikkel
Kalam, Kristjan; Seemen, Helina; Mikkor, Mats; Ritslaid, Peeter; Stern, Raivo; Dueñas, Salvador; Castán, Helena; Tamm, Aile; Kukli, Kaupo
  • Inglise
ECS Journal of Solid State Science and Technology
2162-8777
7
9
2018
117122
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

Viited terviktekstile

dx.doi.org/10.1149/2.0041809jss

Seotud asutused

The University of Valladolid, Department of Electronics; University of Helsinki, Department of Chemistry