Influence of growth temperature on the structure and electrical properties of high-permittivity TiO2 films in TiCl4-H2O and TiCl4-O3 atomic-layer-deposition processes

Arroval, T.; Aarik, L.; Rammula, R.; Mändar, H.; Aarik, J.; Hudec, B.; Hušekova, K.; Fröhlich, K. (2014). Influence of growth temperature on the structure and electrical properties of high-permittivity TiO2 films in TiCl4-H2O and TiCl4-O3 atomic-layer-deposition processes. physica status solidi (a), 211 (2), 425−432.10.1002/pssa.201330086.
ajakirjaartikkel
Arroval, T.; Aarik, L.; Rammula, R.; Mändar, H.; Aarik, J.; Hudec, B.; Hušekova, K.; Fröhlich, K.
  • Inglise
physica status solidi (a)
0031-8965
211
2
2014
425432
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

Viited terviktekstile

dx.doi.org/10.1002/pssa.201330086