Atomic layer deposition of high-k dielectrics on carbon nanoparticles for potential applications in nonvolatile memories

Tamm, Aile; Peikolainen, Anna-Liisa; Kozlova, Jekaterina; Aidla, Aleks; Rammula, Raul; Aarik, Lauri; Lu, Jun; Hultman, Lars; Mändar, Hugo; Marandi, Margus; Kukli, Kaupo; Aarik, Jaan (2012). Atomic layer deposition of high-k dielectrics on carbon nanoparticles for potential applications in nonvolatile memories. EMRS 2012 Spring Meeting, Carbon- or Nitrogen-Containing Nanostructured Thin Films: EMRS 2012 Spring Meeting, Strasbourg, France, 14-18. May 2012.
publitseeritud konverentsiettekanne
Tamm, Aile; Peikolainen, Anna-Liisa; Kozlova, Jekaterina; Aidla, Aleks; Rammula, Raul; Aarik, Lauri; Lu, Jun; Hultman, Lars; Mändar, Hugo; Marandi, Margus; Kukli, Kaupo; Aarik, Jaan
  • Inglise
Süsinik nanopallidele aatomkiht sadestatud kõrge dielektrilise läbitavusega kilede uurimine
EMRS 2012 Spring Meeting, Carbon- or Nitrogen-Containing Nanostructured Thin Films
EMRS 2012 Spring Meeting, Strasbourg, France, 14-18. May 2012
2012
Ilmunud
5.2. Konverentsiteesid, mis ei kuulu valdkonda 5.1

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