A comparative study of the electrical properties of TiO2 films grown by high-pressure reactive sputtering and atomic layer deposition

Duenas, S.; Castan, H.; Garcia, H.; San Andres, E.; Toledano-Luque, M.; Martil, I.; Gonzalez-Diaz, G.; Kukli, K.; Uustare, T.; Aarik, J. (2005). A comparative study of the electrical properties of TiO2 films grown by high-pressure reactive sputtering and atomic layer deposition. Semiconductor Science and Technology, 20 (10), 1044−1051.
ajakirjaartikkel
Duenas, S.; Castan, H.; Garcia, H.; San Andres, E.; Toledano-Luque, M.; Martil, I.; Gonzalez-Diaz, G.; Kukli, K.; Uustare, T.; Aarik, J.
  • Inglise
Semiconductor Science and Technology
IOP Publishing Ltd
0268-1242
20
10
2005
10441051
8
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

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