Precursor-dependent structural and electrical characteristics of atomic layer deposited films: Case study on titanium oxide

Jõgi, I.; Kukli, K.; Aarik, J.; Aidla, A.; Lu, J. (2006). Precursor-dependent structural and electrical characteristics of atomic layer deposited films: Case study on titanium oxide. Materials Science in Semiconductor Processing, 9 (6), 1084−1089.10.1016/j.mssp.2006.10.027.
ajakirjaartikkel
Jõgi, I.; Kukli, K.; Aarik, J.; Aidla, A.; Lu, J.
  • Inglise
Materials Science in Semiconductor Processing
1369-8001
9
6
2006
10841089
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

Viited terviktekstile

dx.doi.org/10.1016/j.mssp.2006.10.027