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Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging

Mochi, I.; Fernandez, S.; Nebling, R.; Locans, U.; Rajeev, R.; Dejkameh, A.; Kazazis, D.; Tseng, L.T.; Danylyuk, S.; Juschkin, L.; Ekinci, Y. (2020). Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging. Journal of Micro/Nanolithography MEMS and MOEMS, 19 (1). DOI: 10.1117/1.JMM.19.1.014002.
artikkel ajakirjas
Mochi, I.; Fernandez, S.; Nebling, R.; Locans, U.; Rajeev, R.; Dejkameh, A.; Kazazis, D.; Tseng, L.T.; Danylyuk, S.; Juschkin, L.; Ekinci, Y.
  • Inglise
Journal of Micro/Nanolithography MEMS and MOEMS
1932-5150
19
1
2020
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index, Emerging Sources Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
Jah
roheline
SCOPUS

Viited terviktekstile

dx.doi.org/10.1117/1.JMM.19.1.014002

Seotud asutused

Paul Scherrer Institut; Rheinisch-Westfälische Technische Hochschule Aachen; Forschungszentrum Jülich (FZJ); Fraunhofer Institute for Laser Technology ILT; JARA-Fundamentals of Future Information Technology

Lisainfo

Article
actinic pattern inspection | EUV | lensless microscopy | pellicle | phase defects
https://www.dora.lib4ri.ch/psi/islandora/object/psi%3A28908/datastream/PDF/Mochi-2020-Quantitative_characterization_of_absorber_and-%28published_version%29.pdf