Growth of TixAl1−xOy films by atomic layer deposition using successive supply of metal precursors

Arroval, Tõnis; Aarik, Lauri; Rammula, Raul; Aarik, Jaan (2015). Growth of TixAl1−xOy films by atomic layer deposition using successive supply of metal precursors. Thin Solid Films, 591 (B), 276−284.10.1016/j.tsf.2015.03.014.
ajakirjaartikkel
Arroval, Tõnis; Aarik, Lauri; Rammula, Raul; Aarik, Jaan
  • Inglise
Growth of TixAl1−xOy films by atomic layer deposition using successive supply of metal precursors
Thin Solid Films
591
B
2015
276284
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

Viited terviktekstile

dx.doi.org/10.1016/j.tsf.2015.03.014