Effect of substrate-enhanced and inhibited growth on atomic layer deposition and properties of aluminum-titanium oxide films

Arroval, Tonis; Aarik, Lauri; Rammula, Raul; Kruusla, Vegard; Aarik, Jaan (2016). Effect of substrate-enhanced and inhibited growth on atomic layer deposition and properties of aluminum-titanium oxide films. Thin Solid Films, 600, 119−125.10.1016/j.tsf.2016.01.024.
ajakirjaartikkel
Arroval, Tonis; Aarik, Lauri; Rammula, Raul; Kruusla, Vegard; Aarik, Jaan
  • Inglise
Thin Solid Films
LAUSANNE
0040-6090
600
600
2016
119125
7
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

Viited terviktekstile

dx.doi.org/10.1016/j.tsf.2016.01.024

Lisainfo

Article
Titanium dioxide; Aluminum oxide; Solid solutions; Atomic layer deposition; Structure