Growth of aluminium nitride on porous silica by atomic layer chemical vapour deposition

Puurunen, R.L.; Root, A.; Sarv, P.; Haukka, S.; Iiskola, E.I.; Lindblad, M.; Krause, A.O.I. (2000). Growth of aluminium nitride on porous silica by atomic layer chemical vapour deposition. Applied Surface Science, 165, 193−202.
ajakirjaartikkel
Puurunen, R.L.; Root, A.; Sarv, P.; Haukka, S.; Iiskola, E.I.; Lindblad, M.; Krause, A.O.I.
Applied Surface Science
165
2000
193202
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

Viited terviktekstile

Lisainfo

EARLY-STAGE GROWTH; SURFACE-CHEMISTRY; CATALYTIC ALUMINAS; OXIDE SURFACES; AMMONIA; TRIMETHYLALUMINUM; ALN; PRECURSORS; ADSORPTION; MECHANISM
ISI