Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates

Kukli, Kaupo; Kemell, Marianna; Castán, Helena; Dueñas, Salvador; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Ritala, Mikko; Leskelä, Markku (2018). <p>Atomic Layer Deposition and Properties of HfO<sub>2</sub>-Al<sub>2</sub>O<sub>3</sub> Nanolaminates</p>. ECS Journal of Solid State Science and Technology, 7 (9), P501−P508.10.1149/2.0261809jss.
ajakirjaartikkel
Kukli, Kaupo; Kemell, Marianna; Castán, Helena; Dueñas, Salvador; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Ritala, Mikko; Leskelä, Markku
  • Inglise
<p>Atomic Layer Deposition and Properties of HfO<sub>2</sub>-Al<sub>2</sub>O<sub>3</sub> Nanolaminates</p>
ECS Journal of Solid State Science and Technology
2162-8769
7
9
2018
P501P508
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

Viited terviktekstile

dx.doi.org/10.1149/2.0261809jss

Seotud asutused

The University of Helsinki, Department of Chemistry The University of Valladolid, Department of Electronics