Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition

Duenas, S.; Castan, H.; Garcia, H.; Barbolla, J.; Kukli, K.; Aarik, J.; Ritala, M.; Leskela, M. (2005). Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition. Microelectronics Reliability, 45, 949−952.
ajakirjaartikkel
Duenas, S.; Castan, H.; Garcia, H.; Barbolla, J.; Kukli, K.; Aarik, J.; Ritala, M.; Leskela, M.
  • Inglise
Microelectronics Reliability
Pergamon-Elsevier Science Ltd
0026-2714
45
2005
949952
4
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

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