Structural study of ZrO2 and HfO2 thin films grown by atomic layer deposition

Niilisk, A.; Aarik, J.; Uustare, T.; Mändar, H.; Tkachev, S.; Manghnani, M.H. (2004). Structural study of ZrO2 and HfO2 thin films grown by atomic layer deposition. Abstracts: The Fourth International Conference on Advanced Optical Materials and Devices (AOMD-4); Tartu, Estonia; July 6-9, 2004. Ed. A. Rosental. Tartu: Tartu University Press, 41−41.
publitseeritud konverentsiettekanne
Niilisk, A.; Aarik, J.; Uustare, T.; Mändar, H.; Tkachev, S.; Manghnani, M.H.
  • Inglise
Aatomkihtsadestamisega kasvatatud ZrO2 ja HfO2 õhukeste kilede struktuuriuuringud
Structural study of ZrO2 and HfO2 thin films grown by atomic layer deposition
Abstracts
A. Rosental
The Fourth International Conference on Advanced Optical Materials and Devices (AOMD-4); Tartu, Estonia; July 6-9, 2004
Tartu
Tartu University Press
998556913X
2004
4141
Ilmunud
5.2. Konverentsiteesid, mis ei kuulu valdkonda 5.1

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