Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

Aarik, J.; Aidla, A.; Mandar, H.; Uustare, T. (2001). Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism. Applied Surface Science, 172, 148−158.
ajakirjaartikkel
Aarik, J.; Aidla, A.; Mandar, H.; Uustare, T.
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Applied Surface Science
Elsevier Science BV
0169-4332
172
2001
148158
11
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
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ISI Web of Science