Chemical resistance of TiO2 and Al2O3 single-layer and multilayer coatings atomic layer deposited from hydrogen-free precursors on silicon and stainless steel

Lauri Aarik, Jekaterina, Kozlova; Hugo, Mändar; Jaan, Aarik; Väino,Sammelselg (2019). Chemical resistance of TiO2 and Al2O3 single-layer and multilayer coatings atomic layer deposited from hydrogen-free precursors on silicon and stainless steel. Materials Chemistry and Physics, 228, 285−292.10.1016/j.matchemphys.2019.02.053.
ajakirjaartikkel
Lauri Aarik, Jekaterina, Kozlova; Hugo, Mändar; Jaan, Aarik; Väino,Sammelselg
  • Inglise
Materials Chemistry and Physics
228
2019
285292
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

Viited terviktekstile

doi.org/10.1016/j.matchemphys.2019.02.053