Thickness profiles of thin films caused by secondary reactions in flow-type atomic layer deposition reactors

Siimon, H.; Aarik, J. (1997). Thickness profiles of thin films caused by secondary reactions in flow-type atomic layer deposition reactors. Journal of Physics D: Applied Physics, 30 (12), 1725−1728.
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Siimon, H.; Aarik, J.
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Journal of Physics D: Applied Physics
IOP Publishing Ltd
0022-3727
30
12
1997
17251728
4
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
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