Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

Aarik, J.; Aidla, A.; Uustare, T.; Ritala, M.; Leskela, M. (2000). Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process. Applied Surface Science, 161, 385−395.
ajakirjaartikkel
Aarik, J.; Aidla, A.; Uustare, T.; Ritala, M.; Leskela, M.
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Applied Surface Science
Elsevier Science BV
0169-4332
161
2000
385395
11
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
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ISI Web of Science