Transmission electron microscopy studies of HfO2 thin films grown by chloride-based atomic layer deposition

Mitchell, D.R.G.; Aidla, A.; Aarik, J. (2006). Transmission electron microscopy studies of HfO2 thin films grown by chloride-based atomic layer deposition. Applied Surface Science, 253 (2), 606−617.
ajakirjaartikkel
Mitchell, D.R.G.; Aidla, A.; Aarik, J.
  • Inglise
Applied Surface Science
0169-4332
253
2
2006
606617
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

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