Nanoscale characterization of TiO2 films grown by atomic layer deposition on RuO2 electrodes

Murakami, Katsuhisa; Rommel, Mathias; Hudec, Boris; Rosova, Alica; Hus'ekova, Kristina; Dobroc'ka, Edmund; Rammula, Raul, Kasikov, Aarne; Han, Jeong Hwan; Lee, Wongkyu, Song, Seul Ji; Paskaleva, Albena; Bauer, Anton J; Frey, Lothar; Fröhlich, Karol; Aarik, Jaan; Hwang, Cheol Seong (2014). Nanoscale characterization of TiO2 films grown by atomic layer deposition on RuO2 electrodes. ACS Applied Materials and Interfaces, 6 (4), 2486−2492.10.1021/am4049139.
ajakirjaartikkel
Murakami, Katsuhisa; Rommel, Mathias; Hudec, Boris; Rosova, Alica; Hus'ekova, Kristina; Dobroc'ka, Edmund; Rammula, Raul, Kasikov, Aarne; Han, Jeong Hwan; Lee, Wongkyu, Song, Seul Ji; Paskaleva, Albena; Bauer, Anton J; Frey, Lothar; Fröhlich, Karol; Aarik, Jaan; Hwang, Cheol Seong
  • Inglise
RuO2 elektroodide peale aatomkihtsadestamisega kasvatatud TiO2 kilede iseloomustamine nanoskaalas
ACS Applied Materials and Interfaces
1944-8244
6
4
2014
24862492
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

Viited terviktekstile

dx.doi.org/10.1021/am4049139

Seotud asutused

Chair of Electron Devices, University of Erlangen-Nuremberg, Cauerstrasse 6, 91058 Erlangen, Germany

Lisainfo

Article
high-k dielektrikud, juhtiv AFM, metall-isolaator-metall kondensaator, TiO2, Ruo2