Atomic layer deposition and properties of ZrO2/Fe2O3 thin films

Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Rähn, Mihkel; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán,Helena; García, Héctor; (2018). <p>Atomic layer deposition and properties of ZrO<sub>2</sub>/Fe<sub>2</sub>O<sub>3</sub> thin films</p>. Beilstein Journal of Nanotechnology, 9 (14), 119−128.10.3762/bjnano.9.14.
ajakirjaartikkel
Kalam, Kristjan; Seemen, Helina; Ritslaid, Peeter; Rähn, Mihkel; Tamm, Aile; Kukli, Kaupo; Kasikov, Aarne; Link, Joosep; Stern, Raivo; Dueñas, Salvador; Castán,Helena; García, Héctor;
  • Inglise
<p>Atomic layer deposition and properties of ZrO<sub>2</sub>/Fe<sub>2</sub>O<sub>3</sub> thin films</p>
Beilstein Journal of Nanotechnology
2190-4286
9
14
2018
119128
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

Viited terviktekstile

dx.doi.org/10.3762/bjnano.9.14

Seotud asutused

Institute of Physics, University of Tartu, W. Ostwald 1, 50411 Tartu, Estonia; Department of Chemistry, University of Helsinki, P. O. Box 55, FI-00014 Helsinki, Finland; National Institute of Chemical Physics and Biophysics, Akadeemia tee 23, 12618 Tallinn, Estonia; and Department of Electronics, University of Valladolid, Paseo Belén 15, 47011 Valladolid, Spain