Mechanisms of suboxide growth and etching in atomic layer deposition of tantalum oxide from TaCl5 and H2O

Aarik, J.; Kukli, K.; Aidla, A.; Pung, L. (1996). Mechanisms of suboxide growth and etching in atomic layer deposition of tantalum oxide from TaCl5 and H2O. Applied Surface Science, 103 (4), 331−341.
ajakirjaartikkel
Aarik, J.; Kukli, K.; Aidla, A.; Pung, L.
  • Inglise
Applied Surface Science
Elsevier Science BV
0169-4332
103
4
1996
331341
11
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
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