Influence of annealing on atomic layer deposited Cr2O3–TiO2 thin films

Pärna, Rainer; Tarre, Aivar; Gerst, Alar; Mändar, Hugo; Niilisk, Ahti; Uustare, Teet; Rosental, Arnold; Sammelselg, Väino (2006). Influence of annealing on atomic layer deposited Cr2O3-TiO2 thin films. Program and Abstracts: 5th International Conference on Advanced Optical Materials and Devices (AOMD-5); Vilnius, Lithuania; 27-30 August, 2006. Ed. Steponas Ašmontas. Vilnius: Semiconductor Physics Institute, Lithuania, 44.
publitseeritud konverentsiettekanne
Pärna, Rainer; Tarre, Aivar; Gerst, Alar; Mändar, Hugo; Niilisk, Ahti; Uustare, Teet; Rosental, Arnold; Sammelselg, Väino
  • Inglise
Lõõmutamise mõju aatomkihtsadestatud Cr2O3-TiO2 õhukestele kiledele
Influence of annealing on atomic layer deposited Cr2O3-TiO2 thin films
Program and Abstracts
Steponas Ašmontas
5th International Conference on Advanced Optical Materials and Devices (AOMD-5); Vilnius, Lithuania; 27-30 August, 2006
Vilnius
Semiconductor Physics Institute, Lithuania
9986-9284-8-6
2006
44
Ilmunud
5.2. Konverentsiteesid, mis ei kuulu valdkonda 5.1

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