Effect of oxygen on active Al concentration in ZnO:Al thin films made by PLD

Kodu, M.; Arroval, T.; Avarmaa, T.; Jaaniso, R.; Kink, I.; Leinberg, S.; Savi, K.; Timusk, M. (2014). Effect of oxygen on active Al concentration in ZnO:Al thin films made by PLD. Applied Surface Science, 320, 756−763.10.1016/j.apsusc.2014.08.138.
ajakirjaartikkel
Kodu, M.; Arroval, T.; Avarmaa, T.; Jaaniso, R.; Kink, I.; Leinberg, S.; Savi, K.; Timusk, M.
Applied Surface Science
0169-4332
320
2014
756763
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

Viited terviktekstile

dx.doi.org/10.1016/j.apsusc.2014.08.138

Lisainfo

Article