XPS and AFM investigation of hafnium dioxide thin films prepared by atomic layer deposition on silicon

Sammelselg, V.; Rammula, R.; Aarik, J.; Kikas, A.; Kooser, K.; Käämbre, T. (2007). XPS ad AFM investigation of hafnium dioxide thin films prepared by atomic layer deposition on silicon. Journal of Electron Spectroscopy and Related Phenomena, 156, 150−154.dx.doi.org/10.1016/j.elspec.2006.12.070.
ajakirjaartikkel
Sammelselg, V.; Rammula, R.; Aarik, J.; Kikas, A.; Kooser, K.; Käämbre, T.
  • Inglise
XPS ad AFM investigation of hafnium dioxide thin films prepared by atomic layer deposition on silicon
Journal of Electron Spectroscopy and Related Phenomena
0368-2048
156
2007
150154
Ilmunud
1.1. Teadusartiklid, mis on kajastatud Web of Science andmebaasides Science Citation Index Expanded, Social Sciences Citation Index, Arts & Humanities Citation Index ja/või andmebaasis Scopus (v.a. kogumikud)
WOS

Viited terviktekstile

dx.doi.org/dx.doi.org/10.1016/j.elspec.2006.12.070